Microcontact‐Printing‐Assisted Access of Graphitic Carbon Nitride Films with Favorable Textures toward Photoelectrochemical Application

• DOI: 10.1002/adma.201404543
• Publication Date: 2014-12-10T08:13:55Z
• Authors: Jian Liu; Hongqiang Wang; Zu Peng Chen; Helmuth Moehwald; Sebastian Fiechter; Roel van de Krol; Liping Wen; Lei Jiang; Markus Antonietti
• Keywords: Carbon nitride; Photocurrent; Carbon fibers; Photoelectrochemistry

An "ink" (cyanamide) infiltrated anodic aluminum oxide (AAO) stamp is found capable of printing carbon nitride films featuring regular microstructures the onto substrates via in situ "chemical vapor deposition". A photocurrent density 30.2 μA cm(-2 --) at 1.23 VRHE achieved for a film on conductive substrate, which so far highest value pure based photoelectrochemical devices.