Wafer‐Scale Precise Patterning of Organic Single‐Crystal Nanowire Arrays via a Photolithography‐Assisted Spin‐Coating Method

• DOI: 10.1002/adma.201503019
• Publication Date: 2015-10-13T23:14:51Z
• Authors: Wei Deng; Xiujuan Zhang; Liang Wang; Jincheng Wang; Qixun Shang; Xiaohong Zhang; Liming Huang; Jiansheng Jie
• Keywords: Spin Coating

A photolithography-assisted spin-coating approach is developed to produce single-crystal organic nanowire (NW) arrays at designated locations with high precision and efficiency. This strategy enables the large-scale fabrication of NW nearly same accuracy, reliability, flexibility as photolithography. The mobilities NWs enable control switch multicolored light-emitting devices good stability.