Athermal Azobenzene‐Based Nanoimprint Lithography

• DOI: 10.1002/adma.201505552
• Publication Date: 2016-01-29T01:58:19Z
• Authors: Christian Probst; Christoph Meichner; Klaus Kreger; Lothar Kador; Christian Neuber; Hans‐Werner Schmidt
• Keywords: Nanoimprint lithography; Azobenzene

A novel nanoimprint lithography technique based on the photofluidization effect of azobenzene materials is presented. The tunable process allows for imprinting under ambient conditions without crosslinking reactions, so that shrinkage resist avoided. Patterning surfaces in regime from micrometers down to 100 nm demonstrated. As a service our authors and readers, this journal provides supporting information supplied by authors. Such are peer reviewed may be re-organized online delivery, but not copy-edited or typeset. Technical support issues arising (other than missing files) should addressed Please note: publisher responsible content functionality any Any queries content) directed corresponding author article.