Stacking and Twisting of Freestanding Complex Oxide Thin Films

• DOI: 10.1002/adma.202203187
• Publication Date: 2022-07-28T18:43:25Z
• Authors: Ying Li; Cheng Xiang; Francesco M. Chia...; Shinhee Yun; Haiwu Zhang; Daniel J. Kelly; Rasmus T. Dahm; Charline K. R. Ki...; Thomas E. Le Coza...; Felix Trier; Dennis V. Christe...; Timothy J. Booth; Søren B. Simonsen; Shima Kadkhodazadeh; Thomas S. Jespersen; Nini Pryds
• Keywords: Complex oxide

The integration of dissimilar materials in heterostructures has long been a cornerstone modern science-seminal examples are 2D and van der Waals heterostructures. Recently, new methods have developed that enable the realization ultrathin freestanding oxide films approaching limit. Oxides offer degrees freedom, due to strong electronic interactions, especially 3d orbital electrons, which give rise rich exotic phases. Inspired by this progress, platform for assembling thin with different orientations into artificial stacks heterointerfaces is developed. It shown can be tailored controlling stacking sequences, as well twist angle between constituent layers atomically sharp interfaces, leading distinct moiré patterns transmission electron microscopy images full stacks. Stacking twisting recognized key degree structural freedom but, until now, never realized materials. This approach opens unexplored avenues fabricating 3D membranes across broad range complex crystal structures functionalities not available conventional