Polysilazane‐Coated Films Achieving Record‐High Moisture Barrier Performance with Sub‐10 Seconds Densification Using High‐Power VUV Irradiation

• DOI: 10.1002/advs.202415721
• Publication Date: 2025-02-22T08:13:26Z
• Authors: Luyang Song; He Sun; Yoshiyuki Suzuri
• Keywords: Ultraviolet

Abstract An ultra‐high moisture barrier compact SiN X film can be achieved from solution‐processed perhydropolysilazane (PHPS) through vacuum ultraviolet (VUV) light exposure. This study investigates the photochemical reactions and photo‐densification of PHPS‐based films under varying VUV intensities, focusing on their effects performance. Photo‐dehydrogenation PHPS, involving N─H Si─H bond cleavage, is efficient unaffected by intensity. However, shows a strong dependence intensity, particularly above 290 mW cm −2 . Higher intensities enhance Si─N alter dynamics, reduce free volume rearrangement, facilitating rapid network reconstruction essential for properties. High‐power at 309 establishes new benchmark via solution processing, achieving record‐low average water vapor transmission rate (WVTR) 1.6 × 10 −5 g m day −1 Films are produced in s per layer, maintaining property 3.8 The optimal refractive index top 30 nm layer 1.74–1.77, controlling WVTR within , ensuring superior performance flexible electronic devices, such as perovskite solar cells organic photovoltaics.