ChemInform Abstract: Corrosion Resistance of Artificial Passivation Films of Fe2O3‐Cr2O3‐ NiO Formed by Metalorganic Chemical Vapor Deposition (MOCVD).

• DOI: 10.1002/chin.199342016
• Publication Date: 2010-09-03T23:45:28Z
• Authors: K. SUGIMOTO; M. SETO; S. TANAKA; N. HARA
• Keywords: Non-blocking I/O; Passivation; Deposition

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