Oxygen and hydrogen profiles and electrical properties of unintentionally doped gallium nitride grown by hydride vapor phase epitaxy
Vapor phase
DOI:
10.1002/crat.201570011
Publication Date:
2015-06-05T16:14:42Z
AUTHORS (8)
ABSTRACT
As a consequence of the growth process, undoped commercially available GaN epi layers possess unintentionally incorporated dopants. Electrical and optical methods reveal doping level mobility profile which correlates to oxygen impurity distribution lattice strain
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