X‐Ray White Beam Interferences on Thin Crystals

• DOI: 10.1002/crat.202100085
• Publication Date: 2021-08-06T08:43:41Z
• Authors: Mirko Heckert; Stefan Enghardt; Jürgen Bauch
• Keywords: 02 engineering and technology; 0210 nano-technology

AbstractResults of white beam X‐ray interference measurements on almost perfect semiconductor wafers are presented. A specific measurement geometry allows for the investigation of diffraction effects on thin wafers down to at least 375 µm with a simple experimental setup (standard lab CT with microfocus X‐ray tube). Furthermore, the dynamic diffraction effect of double refraction has been studied in detail for thicker samples. This might lead to a new wafer testing method as the observed dynamic effects are very sensible on crystal quality.