On‐Chip Integrated Waveguide Amplifiers on Erbium‐Doped Thin‐Film Lithium Niobate on Insulator

• DOI: 10.1002/lpor.202100030
• Publication Date: 2021-06-26T19:10:37Z
• Authors: Junxia Zhou; Youting Liang; Zhaoxiang Liu; Wei Chu; Haisu Zhang; Difeng Yin; Zhiwei Fang; Rongbo Wu; Jianhao Zhang; Wei Chen; Zhe Wang; Yuan Zhou; Min Wang; Ya Cheng
• Keywords: Erbium; Waveguide; Net gain

Abstract On‐chip light amplification with integrated optical waveguide fabricated on erbium‐doped thin‐film lithium niobate insulator (TFLNOI) is demonstrated using the photolithography‐assisted chemomechanical etching (PLACE) technique. A maximum internal net gain of 18 dB in small‐signal‐gain regime measured at peak emission wavelength 1530 nm for a length 3.6 cm, indicating differential per unit 5 cm −1 . This work paves way to monolithic integration diverse active and passive photonic components TFLNOI platform.