P‐15.25: Study on Stability of Fine Metal Mask

• DOI: 10.1002/sdtp.17409
• Publication Date: 2024-06-27T15:41:43Z
• Authors: Gongzheng Zang; Hui Li; Panpan Wang; Ziwen Zhang
• Keywords: 02 engineering and technology; 0210 nano-technology

With the increasing demand for high PPI and large‐sized OLED, the stability of Fine Metal Mask (FMM) in the evaporation process has become crucial. This article uses finite element analysis to investigate the effects of pixel structure, FMM tension force and the width of FMM beyond the support mask on the stability of FMM. The simulation results show that, the greater tension force, bigger E22 of FMM pixel structure, and extended width of FMM beyond the support mask will make the FMM sticks more stable during evaporation. The greatest influence factor is the tension force. Hence, it is suggested to apply greater tension force on FMM for high‐PPI and high‐aperture‐ratio OLED.