Influence of nitrogen concentration on electrical, mechanical, and structural properties of tantalum nitride thin films prepared via DC magnetron sputtering

• DOI: 10.1007/s00339-022-05501-4
• Publication Date: 2022-04-16T04:02:41Z
• Authors: Davoud Dastan; Ke Shan; Azadeh Jafari; Farzan Gity; Xi-Tao Yin; Zhicheng Shi; Najlaa D. Alharbi; Bilal Ahmad Reshi; Wenbin Fu; Ştefan Ţălu; Loai Aljerf; Hamid Garmestani; Lida Ansari
• Keywords: Tantalum nitride