Improving electrochemical performance of NiO films by electrodeposition on foam nickel substrates

• DOI: 10.1007/s10800-009-9848-8
• Publication Date: 2009-02-28T12:29:23Z
• Authors: Hongbo Wang; Qinmin Pan; Xiaopeng Wang; Geping Yin; Jianwei Zhao
• Keywords: Non-blocking I/O

NiO films for lithium-ion batteries were deposited on copper plates and foam nickel substrates by electrodeposition and subsequent heat treatment at 300 °C. At a discharge/charge rate of 0.1 C, foam NiO films delivered reversible capacity larger than 650 mAh g−1 and capacity retention over 93% after 50 cycles. NiO films deposited on foam nickel exhibited higher reversible capacity, better cyclability, as well as higher rate capability than those on copper plates. The unique three-dimensionally porous morphologies of foam NiO films were responsible for the better electrochemical performance, which provided not only high electrode/electrolyte contact area but also a good electronic conduction matrix. The present finding offers a new pathway for the large scale fabrication of high-energy-density electrodes for lithium-ion batteries.