Impact of oxygen content on phase constitution and ferroelectric behavior of hafnium oxide thin films deposited by reactive high-power impulse magnetron sputtering
Hafnium
DOI:
10.1016/j.actamat.2022.118220
Publication Date:
2022-08-04T21:57:33Z
AUTHORS (21)
ABSTRACT
SUPPLEMENTAL MATERIAL
Coming soon ....
REFERENCES (82)
CITATIONS (22)
EXTERNAL LINKS
PlumX Metrics
RECOMMENDATIONS
FAIR ASSESSMENT
Coming soon ....
JUPYTER LAB
Coming soon ....