Ceria concentration effect on chemical mechanical polishing of optical glass

• DOI: 10.1016/j.apsusc.2006.10.074
• Publication Date: 2006-12-13T07:21:59Z
• Authors: Liangyong Wang; Kailiang Zhang; Zhitang Song; Songlin Feng
• Keywords: Chemical Mechanical Planarization

Abstract It was found material removal rate (MRR) sharply increased from 250 to 675 nm/min as the concentration decreased from 1 to 0.25 wt% in optical glass chemical mechanical polishing (CMP) using ceria slurries. Scanning electron microscopy was employed to characterize the ceria abrasive used in the slurry. Atomic force microscopy results showed good surface had been got after CMP. Schematic diagrams of the CMP process were shown. Furthermore, the absorption spectra indicated a sudden change from Ce 4+ to Ce 3+ of the ceria surface when the concentration decreased, which revealed a quantum origin of the phenomenon.