Si-based thin film coating on Y-TZP: Influence of deposition parameters on adhesion of resin cement

• DOI: 10.1016/j.apsusc.2013.05.111
• Publication Date: 2013-05-30T17:32:07Z
• Authors: José Renato Caval...; Lafayette Nogueir...; Marcos Massi; Alecssandro de Mo...; Marco Antonio Bot...; Argemiro Soares d...; Mutlu Özcan
• Keywords: Energy-dispersive X-ray spectroscopy

This study evaluated the influence of deposition parameters for Si-based thin films using magnetron sputtering coating zirconia and subsequent adhesion resin cement. Zirconia ceramic blocks were randomly divided into 8 groups specimens either ground finished polished or conditioned air-abrasion with alumina particles coated silica. In remaining groups, film argon/oxygen discharge at 8:1 20:1 flux. one group, was performed on air-abraded surfaces. After application bonding agent, cement bonded. Profilometry, goniometry, Energy Dispersive X-ray Spectroscopy Rutherford Backscattering analysis Adhesion to tested shear bond test debonded surfaces examined Scanning Electron Microscopy. applied rough increased (22.78 ± 5.2 MPa) compared those other methods (0–14.62 (p = 0.05). Mixed type failures more frequent in Si groups. wettability control group but did not change roughness, considering evaluated. Deposition after influenced initial zirconia.