Annealing of a (Hf0.2Ta0.2Ti0.2Nb0.2Zr0.2)C high-entropy ceramic up to 2100 °C: In-situ removal of oxide impurities and microstructural modification
DOI:
10.1016/j.ceramint.2023.09.115
Publication Date:
2023-09-13T00:11:38Z
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