Plasmonic films based on colloidal lithography

• DOI: 10.1016/j.cis.2013.11.010
• Publication Date: 2013-11-23T06:45:38Z
• Authors: Bin Ai; Ye Yu; Helmuth Möhwald; Gang Zhang; Bai Yang
• Keywords: Nanosphere lithography; Next-generation lithography; Maskless lithography; Stencil lithography; Computational lithography

This paper reviews recent advances in the field of plasmonic films fabricated by colloidal lithography. Compared with conventional lithography techniques such as electron beam lithography and focused ion beam lithography, the unconventional colloidal lithography technique with advantages of low-cost and high-throughput has made the fabrication process more efficient, and moreover brought out novel films that show remarkable surface plasmon features. These plasmonic films include those with nanohole arrays, nanovoid arrays and nanoshell arrays with precisely controlled shapes, sizes, and spacing. Based on these novel nanostructures, optical and sensing performances can be greatly enhanced. The introduction of colloidal lithography provides not only efficient fabrication processes but also plasmonic films with unique nanostructures, which are difficult to be fabricated by conventional lithography techniques.