Development of substrate engineered Si-<111>/[100] Patterned Features by anisotropic wet etching with Pt/Pt3Si mask

• DOI: 10.1016/j.matchemphys.2022.126783
• Publication Date: 2022-09-16T04:11:51Z
• Authors: Subrata Mandal; Chirantan Das; Subhrajit Sikdar; Basudev Nag Chowd...; Pintu Singha; Aritra Banerjee; Anupam Karmakar; Sanatan Chattopad...
• Keywords: Isotropic etching; Dry etching