Simulation of initial stage of silicon cluster formation during post-annealing of memristive structures based on silicon oxide films subjected to Si+ implantation

• DOI: 10.1016/j.matlet.2021.131494
• Publication Date: 2021-12-16T02:14:40Z
• Authors: E.V. Okulich; V.I. Okulich; D.I. Tetelbaum; A.N. Mikhaylov
• Keywords: Silicon oxide