Examining the microstructure, morphological features, and wetting characteristics of Ti/TiN/TiAlN thin films produced through RF/DC magnetron co-sputtering
Pulsed DC
DOI:
10.1016/j.mtcomm.2023.107405
Publication Date:
2023-10-27T02:10:50Z
AUTHORS (12)
ABSTRACT
SUPPLEMENTAL MATERIAL
Coming soon ....
REFERENCES (90)
CITATIONS (3)
EXTERNAL LINKS
PlumX Metrics
RECOMMENDATIONS
FAIR ASSESSMENT
Coming soon ....
JUPYTER LAB
Coming soon ....