Metal-containing amorphous carbon (a-C:Ag) and AlN (AlN:Ag) metallo-dielectric nanocomposites

• DOI: 10.1016/j.tsf.2009.09.098
• Publication Date: 2009-10-03T19:45:46Z
• Authors: G.M. Matenoglou; H. Zoubos; A. Lotsari; Ch.E. Lekka; Ph. Komninou; G.P. Dimitrakopulos; C. Kosmidis; G.A. Evangelakis; P. Patsalas
• Keywords: pseudopotentials; ab-initio calculations; growth; coatings; 02 engineering and technology; pulsed-laser deposition; interfaces; nanocomposites; surface; structure; composite films; 0210 nano-technology; pulsed laser deposition; cu; nitride thin-films

Abstract In this work we study the structure of Pulsed Laser Deposited silver-containing amorphous carbon a-C:Ag and AlN:Ag composites. The films have the form of a dielectric matrix (a-C or AlN) incorporating metal nanoclusters of 3–10 nm diameters. The composition of the films and the crystal structure of the inclusions have been determined by in-situ Auger Electron Spectroscopy and transmission electron microscopy, respectively. We show that the incorporation of the metal nanoparticles may severely alter the structure and properties of the matrix and a simple rule of mixture does not apply. The interactions of the possible matrix-nanoparticle interfaces were investigated using ab-initio calculations.