Morphology of TiN thin films grown on SiO2 by reactive high power impulse magnetron sputtering

• DOI: 10.1016/j.tsf.2011.07.041
• Publication Date: 2011-07-26T00:42:59Z
• Authors: F. Magnus; A.S. Ingason; O.B. Sveinsson; S. Olafsson; J.T. Gudmundsson
• Keywords: 02 engineering and technology; 0210 nano-technology

Thin TiN films were grown on SiO(2) by reactive high power impulse magnetron sputtering (HiPIMS) at a range of temperatures from 45 to 600 degrees C. The film properties were compared to films grow ...