Large area patterning of single-wall carbon nanotubes by nanoimprint technology

• DOI: 10.1016/j.tsf.2012.11.094
• Publication Date: 2012-12-06T10:49:44Z
• Authors: Karen S.L. Chong; Maxim V. Kiryukhin; Andrew M.H. Ng
• Keywords: Nanoimprint lithography; Carbon fibers

Abstract Extensive research has gone into probing the remarkable characteristics of single-wall carbon nanotubes (SWNT) and their technological applications. However, the effective manipulation of these nanosized materials on a large scale to control macro level properties of a device still poses a challenge. We present the use of nanoimprint lithography in combination with a layer-by-layer deposition technique and a lift-off process to pattern the SWNT films into 2 μm and 250 nm gratings over a 1 × 2 cm area. Using these techniques, we have demonstrated control over the density of the carbon nanotubes. This has enabled us to tune the transparency and resistivity of the SWNT film. These processes were then used to create a simple circuit where current flowed through 2 μm wide SWNT lines to power a light emitting diode. The resistivity of those lines were found to be 6.6 × 10− 3 Ω cm.