Conditions for the growth of smooth La0.7Sr0.3MnO3 thin films by pulsed electron ablation
Condensed Matter - Materials Science
Magnetoresistance
Materials Science (cond-mat.mtrl-sci)
FOS: Physical sciences
Lanthanum strontium manganite Manganese perovskite Atomically flat Thin film Magnetoresistance Channel-spark Pulsed electron beam deposition
Pulsed electron beam deposition
530
01 natural sciences
7. Clean energy
Condensed Matter - Other Condensed Matter
0103 physical sciences
Channel-spark
Manganese perovskite
Thin film
Other Condensed Matter (cond-mat.other)
DOI:
10.1016/j.tsf.2013.02.008
Publication Date:
2013-02-16T01:46:05Z
AUTHORS (13)
ABSTRACT
original paper, thin film optimization, 25 pages, 9 figures<br/>We report on the optimisation of the growth conditions of manganite La0.7Sr0.3MnO3 (LSMO) thin films prepared by Channel Spark Ablation (CSA). CSA belongs to pulsed electron deposition methods and its energetic and deposition parameters are quite similar to those of pulsed laser deposition. The method has been already proven to provide manganite films with good magnetic properties, but the films were generally relatively rough (a few nm coarseness). Here we show that increasing the oxygen deposition pressure with respect to previously used regimes, reduces the surface roughness down to unit cell size while maintaining a robust magnetism. We analyse in detail the effect of other deposition parameters, like accelerating voltage, discharging energy, and temperature and provide on this basis a set of optimal conditions for the growth of atomically flat films. The thicknesses for which atomically flat surface was achieved is as high as about 10-20 nm, corresponding to films with room temperature magnetism. We believe such magnetic layers represent appealing and suitable electrodes for various spintronic devices.<br/>
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