Low-temperature deposition of thermochromic VO2 thin films on glass substrates

• DOI: 10.1016/j.tsf.2016.07.051
• Publication Date: 2016-07-26T09:08:14Z
• Authors: Yongwon Choi; Yungjin Jung; Hyunbin Kim
• Keywords: 0103 physical sciences; 01 natural sciences; 7. Clean energy

Abstract Highly dense and highly crystalline vanadium dioxide (VO 2 ) thermochromic thin films were successfully sputter-deposited on glass substrates at a low substrate temperature of 300 °C. By superimposition of RF and DC magnetron sputtering, we were able to fabricate VO 2 films with high solar transition efficiency (△T sol ) of 12.8% at a substrate temperature of 300 °C, which was comparable to the results attained at 450 °C by conventional DC sputtering. The VO 2 crystallization at a lower temperature of 300 °C could be achieved using a high-energy and high-density plasma induced by RF-superimposed DC sputtering. The hysteresis curves of transmittance as a function of temperature revealed that the VO 2 films by RF-superimposed DC sputtered at 300 °C exhibited a reduced transition temperature of 59 °C and a narrow hysteresis width of 3 °C. The enhanced transition properties might result from the compressive stress in the b and c axes as well as the densification of the films due to ion bombardment effect.