PbI2 Nanocrystal Growth by Atomic Layer Deposition from Pb(tmhd)2 and HI

• DOI: 10.1021/acs.chemmater.1c03093
• Publication Date: 2022-03-08T22:40:15Z
• Authors: Jacob N. Vagott; Kathryn Bairley; Juanita Hidalgo; Carlo A. R. Perini; Andrés-Felipe Cas...; Sarah Lombardo; Barry Lai; Lihua Zhang; Kim Kisslinger; Josh Kacher; Juan-Pablo Correa...
• Keywords: Trihalide

Atomic layer deposition (ALD) allows for fine control over the thickness, stoichiometry, and structural defects of materials. ALD provides a suitable route to deposit lead halides, which can further be converted perovskites photovoltaics, photoemission, photodetection, among other applications. Deposition halides by has already begun explored; however, precursors used in published processes are highly hazardous, require expensive fabrication processes, or contain impurities that jeopardize optoelectronic properties metal halide after conversion. In this work, we deposited iodide (PbI2) facile process involving only two readily accessible low-cost precursors. PbI2 nanocrystals were grown on soda-lime glass (SLG), silicon dioxide support grids, wafer substrates provided groundwork investigation into developing perovskite ALD. The ALD-grown was characterized annular dark-field scanning transmission electron microscopy (ADF-STEM), atomic force (AFM), high resolution (HRTEM), X-ray fluorescence (XRF), photoemission spectroscopy (XPS), methods. This work presents first step synthesize with applications such as interfacial layers photovoltaics microcavities lasing.