Decoupling Substrate Surface Interactions in Block Polymer Thin Film Self-Assembly

• DOI: 10.1021/acs.macromol.5b00833
• Publication Date: 2015-06-29T12:57:57Z
• Authors: Cameron K. Shelton; Thomas H. Epps
• Keywords: Hamaker constant

We report a highly predictive approach to capturing the major substrate–polymer interactions that can dominate nanoscale ordering and orientation in block polymer (BP) thin films. Our allows one create designer BP films on modified substrates while minimizing need for extensive parameter space exploration. Herein, we systematically quantitatively examined influence of substrate surface energy components (dispersive polar interactions) film self-assembly, our analysis demonstrates although total plays dominant role wetting, individual contributions from dispersive composite through-film behavior. Additionally, long-range forces as described by Hamaker constant are under-recognized factors assembly alter expected wetting behavior affecting thermodynamic stability. This more inclusive interpretation effects, including constant, was supported studies interfacial gleaned temporal island/hole measurements via situ optical microscopy during thermal annealing. The formalism correctly predicted experimental hole formation sizes over wide range energies when employing appropriate relationships based decoupled components. results indicate promising universal matching desired self-assembly with chemically tailored modifications.