Orienting Block Copolymer Thin Films via Entropy

• DOI: 10.1021/acs.macromol.5b02685
• Publication Date: 2016-01-13T19:39:34Z
• Authors: Ting-Ya Lo; Ashkan Dehghan; Prokopios Georgop...; Apostolos Avgerop...; An-Chang Shi; Rong-Ming Ho
• Keywords: Nanoporous; Polystyrene

Controlling the orientation of nanostructured thin films block copolymers (BCPs) is essential for next-generation lithography using BCPs. According to conventional wisdom, BCP mainly determined by molecular interactions (enthalpy-driven orientation). Here, we show that entropic effect can be used control films. Specifically, architecture star-block consisting polystyrene (PS) and poly(dimethylsiloxane) (PDMS) blocks regulate contribution self-assembled nanostructures. The study unequivocally demonstrate with same volume fractions PS PDMS, perpendicularly oriented nanostructures could induced via an regulated number arms. Also, feasibility copolymer practical applications demonstrated film as a mask nanolithography or template fabrication nanoporous monolith.