Direct Silyl–Heck Reaction of Chlorosilanes

• DOI: 10.1021/acs.orglett.8b00847
• Publication Date: 2018-04-04T18:20:41Z
• Authors: Kazuhiro Matsumoto; Jiadi Huang; Yuki Naganawa; Haiqing Guo; Teruo Beppu; Kazuhiko Sato; Shigeru Shimada; Yumiko Nakajima
• Keywords: Heck Reaction

A nickel complex/Lewis acid combination effectively catalyzed the direct silyl–Heck reaction of chlorosilanes, which are key raw materials in organosilicon industry, to give synthetically important alkenylsilane products. Trichlorosilanes, dichlorosilanes, and monochlorosilanes underwent afford corresponding alkenylsilanes high yields. In reactions a single substitution occurred monoalkenylsilanes highly selective manner.