Molecular Layer Deposition of Organic–Inorganic Hafnium Oxynitride Hybrid Films for Electrochemical Applications

• DOI: 10.1021/acsaem.3c00107
• Publication Date: 2023-05-15T19:05:26Z
• Authors: Hayrensa Ablat; Il-Kwon Oh; Nathaniel E. Richey; Solomon T. Oyakhire; Yufei Yang; Wenbo Zhang; William Huang; Yi Cui; Stacey F. Bent
• Keywords: Hafnium; Hybrid material

The molecular layer deposition (MLD) method can be used to deposit hybrid organic–inorganic films with precisely defined composition, flexible properties, and conformality on different substrates. In this study, hafnium-based polymer were studied as potential coatings for silicon nanoparticles (SiNPs) in composite lithium-ion battery (LIB) anodes, an application which requires the film both stable under electrochemical conditions. Hf-hybrid successfully deposited by MLD using sequential exposure of homoleptic tetrakis(dimethylamido) hafnium complex ethanolamine reactants. self-limiting surface reactions lead a constant growth per cycle (GPC) ∼2.0 Å/cycle at 120 °C. Temperature-dependent was observed, GPC decreasing from ∼2.5 ∼1.1 Å/per temperature increased 65 145 Scanning transmission electron microscopy energy loss spectroscopy mapping confirm that thin, dense, conformal Hf-based is SiNPs. presence expected C–N, C–O, −CH2 moieties confirmed Fourier transform infrared spectroscopy. Hafnium nitride oxide bonds within thin identified X-ray photoelectron Characterization results indicated contain metal oxynitride organic bonds, including C–C, C–N. This tested LIB SiNP anodes artificial solid–electrolyte interphase, showing capacity retention about 35% after 110 cycles application.