Virtual substrate method for nanomaterials characterization

• DOI: 10.1038/ncomms15629
• Publication Date: 2017-05-26T10:22:24Z
• Authors: Bo Da; Jiangwei Liu; Mahito Yamamoto; Yoshihiro Ueda; Kazuyuki Watanabe; Nguyen Thanh Cuong; Songlin Li; Kazuhito Tsukagoshi; Hideki Yoshikawa; Hideo Iwai; Shigeo Tanuma; Hongxuan Guo; Zhaoshun Gao; Xia Sun; Zejun Ding
• Keywords: Nanomaterials; Characterization; Reflection

Abstract Characterization techniques available for bulk or thin-film solid-state materials have been extended to substrate-supported nanomaterials, but generally non-quantitatively. This is because the nanomaterial signals are inevitably buried in from underlying substrate common reflection-configuration techniques. Here, we propose a virtual method, inspired by four-point probe technique resistance measurement as well chop-nod method infrared astronomy, characterize nanomaterials without influence of four interrelated measurements. By implementing this secondary electron (SE) microscopy, SE spectrum (white electrons) associated with reflectivity difference between two different substrates can be tracked and controlled. The used quantitatively investigate covering based on subtle changes transmission high efficiency rivalling that conventional core-level electrons. represents benchmark surface analysis provide ‘free-standing’ information about supported nanomaterials.