Programmable gradational micropatterning of functional materials using maskless lithography controlling absorption

• DOI: 10.1038/srep15629
• Publication Date: 2015-10-22T09:42:44Z
• Authors: Yushin Jung; Howon Lee; Tae-Joon Park; Sungsik Kim; Sunghoon Kwon
• Keywords: Micropatterning

The demand for patterning functional materials precisely on surfaces of stimuli-responsive devices has increased in many research fields. In situ polymerization technology is one the most convenient ways to place a desired location with micron-scale accuracy. To fabricate surfaces, controlling concentration material much as important micropatterning them. However, and simultaneously requires an additional process, such preparing multiple co-flow microfluidic structures numbers solutions various concentrations. Despite applying these processes, fabricating heterogeneous patterns large scale (millimeter scale) still impossible. this study, we propose advanced technique pattern surface micron concentration-controlled manner. Because manipulated by self-assembly surface, complex could be easily fabricated without any procedure. pre-designed absorption amount material, which pre-determined duration UV exposure. We show that resolution reaches up 2.5 μm demonstrate mm-scale objects, maintaining same resolution. also Multi-bit barcoded micro particles verify flexibility our system.