Metal-catalyst-free growth of graphene on insulating substrates by ammonia-assisted microwave plasma-enhanced chemical vapor deposition

• DOI: 10.1039/c7ra04162d
• Publication Date: 2017-06-30T08:13:42Z
• Authors: Shan Zheng; Guofang Zhong; Xingyi Wu; Lorenzo D'Arsiè; John Robertson
• Keywords: Deposition

We study the metal-catalyst-free growth of uniform and continuous graphene on different insulating substrates by microwave plasma-enhanced chemical vapor deposition (PECVD) with a gas mixture C₂H₂, NH₃, H₂ at temperature 700–750 °C.