Single-crystalline-like indium tin oxide thin films prepared by plasma enhanced atomic layer deposition

• DOI: 10.1039/d2tc01834a
• Publication Date: 2022-07-29T13:21:10Z
• Authors: Chia-Hsun Hsu; Zhi-Xuan Zhang; Chun-Yan Shi; Pao-Hsun Huang; Wan-Yu Wu; Dong-Sing Wuu; Peng Gao; Chien-Jung Huang; Shui-Yang Lien; Wen-Zhang Zhu
• Keywords: Indium tin oxide; Deposition

Plasma enhanced atomic layer deposited indium tin oxide films using InCp, TDMASn and O 2 plasma as metal oxygen precursors exhibit a single-crystalline-like structure, high carrier mobility low resistivity.