Photo-enhanced metal-assisted chemical etching of α-gallium oxide grown by halide vapor-phase epitaxy on a sapphire substrate and its applications
DOI:
10.1039/d3ma00424d
Publication Date:
2023-09-05T00:01:45Z
AUTHORS (7)
ABSTRACT
Our study presents photo-enhanced metal-assisted chemical etching of α-Ga2O3 and its properties at various temperatures. The results show great potential for use in α-Ga2O3-based optoelectronic device fabrication.
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