Deposition of fluoropolymer thin films by vacuum-ultraviolet laser ablation

• DOI: 10.1063/1.112055
• Publication Date: 2002-07-26T13:38:29Z
• Authors: Y. Ueno; T. Fujii; F. Kannari
• Keywords: Fluoropolymer; Laser Ablation; Ultraviolet; Deposition; Pulsed Laser Deposition; Polytetrafluoroethylene

Crystalline thin films of polytetrafluoroethylene were deposited on Si(100) wafers by F2 laser (157 nm) ablation in 200 mTorr Ar gas atmosphere. X-ray photoemission spectra indicated that the composition was similar to source material. The surface morphology at room temperature contained numerous fibrous structures size 100–400 nm, but they smoothed out elevated wafer ∼370 K, while crystalline feature still maintained. refractive index ∼1.35 633 nm.