Structure and magnetic properties of pure and Gd-doped HfO2 thin films
Monoclinic crystal system
Pulsed Laser Deposition
Magnetic semiconductor
DOI:
10.1063/1.2172912
Publication Date:
2006-06-12T16:13:20Z
AUTHORS (6)
ABSTRACT
Pure HfO2 and Gd-doped thin films have been grown on different single crystal substrates (silicon, R-Al2O3, LaAlO3) by pulsed laser deposition. X-ray diffraction (XRD) patterns show that the pure are of monoclinic phase. same XRD pattern except their peaks a shift toward lower angles, which indicates Gd dissolves in HfO2. Transmission electron microscopy images columnar growth films. Very weak ferromagnetism is observed at 300 5K, attributed to either impure target materials or signals from substrates. The magnetic properties do not change significantly with postdeposition annealing In addition films, powders were annealed hydrogen flow, ferromagnetic signal was observed.
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