Adjusting the frequency of film bulk acoustic resonators

• DOI: 10.1121/1.2212553
• Publication Date: 2006-06-12T12:13:01Z
• Authors: Li-Peng Wang
• Keywords: 0103 physical sciences; 01 natural sciences

A material may be removed from the top electrode of a film bulk acoustic resonator to alter the mass loading effect and to adjust the frequency of one film bulk acoustic resonator on a wafer relative to other resonators on the same wafer. Similarly, the piezoelectric layer or the bottom electrode may be selectively milled with a focused ion beam to trim the resonator.