Low-temperature Fabrication of Transparent Conducting Anatase Nb-doped TiO2Films by Sputtering

• DOI: 10.1143/apex.1.115001
• Publication Date: 2008-10-24T03:54:09Z
• Authors: Ngoc Lam Huong Hoang; Naoomi Yamada; Taro Hitosugi; Junpei Kasai; Shoichiro Nakao; Toshihiro Shimada; Tetsuya Hasegawa
• Keywords: 02 engineering and technology; 0210 nano-technology

We present a low-temperature (∼300 °C) process for preparing transparent conducting anatase Nb-doped TiO2 (TNO) polycrystalline films by sputtering. first deposited amorphous composed of an oxygen-rich bottom layer and oxygen-deficient top at room temperature. These were then crystallized in reducing atmosphere. The behaved as seed during crystallization the layer, resulting significant improvement crystallinity reduction obtained TNO showing resistivity 6.4×10-4 Ω cm absorption below 10% visible region post-deposition annealing 400 °C. developed was applied to fabricating on plastics glass with low glass-transition