High-reflectivity HfO_2/SiO_2 ultraviolet mirrors

• DOI: 10.1364/ao.41.003256
• Publication Date: 2007-08-17T12:30:58Z
• Authors: Philippe Torchio; Alexandre Gatto; Marco Alvisi; Gérard Albrand; Norbert Kaiser; Claude Amra
• Keywords: [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics]; 0103 physical sciences; 01 natural sciences

High-reflectivity dense multilayer coatings were produced for the ultraviolet spectral region. Thin-film single layers and UV mirrors were deposited by ion plating and plasma ion-assisted deposition high-energetic technologies. Optical characterizations of HfO2 and SiO2 single layers are made. The optical constants obtained for these two materials are presented. HfO2 and SiO2 mirrors with a reflectance of approximately 99% near 250 nm are reported.