Fast optical proximity correction method based on nonlinear compressive sensing

• DOI: 10.1364/oe.26.014479
• Publication Date: 2018-05-23T18:51:58Z
• Authors: Xu Ma; Zhiqiang Wang; Yanqiu Li; Gonzalo R. Arce; Lisong Dong; Javier Garcia-Frias
• Keywords: Optical proximity correction; Upsampling

Optical proximity correction (OPC) is an extensively used resolution enhancement technique (RET) in optical lithography. To date, the computational efficiency has become a big issue for pixelated OPC techniques due to increasing complexity of lithographic masks modern integrated circuits. This paper first apply nonlinear compressive sensing (CS) theory break through gradient-based methods. The proposed method reduces dimensionality problem by downsampling layout pattern. Then, cost function established guarantee lithography imaging performance on downsampled layout. Under sparsity assumption mask, formulated as inverse CS reconstruction problem. iterative hard thresholding (IHT) algorithm then solve proves improve traditional methods, while improving process windows systems. Benefiting from sparse property mask patterns, manufacturability can also be improved compared