Fluorinated porous organic frameworks for C2F6/CF4 gases separation

• DOI: 10.20517/cs.2023.79
• Publication Date: 2024-08-08T08:58:11Z
• Authors: Yinhui Li; Yue Wu; Shanshan Wang; Yu Fu; Xiaoyu Li; Jiahui Zeng; Wenxiang Zhang; Heping Ma
• Keywords: Fluorocarbon; Fluorine

As an indispensable raw material for silicon-based semiconductor industry, carbon tetrafluoride (CF4) is widely used as plasma etching and cleaning gas in the manufacture of semiconductors. How to efficiently remove C2F6 impurity during CF4 production process a challenging task industry requires high-purity gas. Herein, two fluorine-functionalized porous organic frameworks (F-POFs) named SPPOF-4F SPPOF-8F were synthesized separation C2F6/CF4 gases. Single-component adsorption experiments ideal adsorbed solution theory (IAST) calculations indicate that can selectively adsorb from mixture. Molecular simulations have further complemented these experimental findings by revealing F-induced host-guest interactions between F-POFs at molecular level. Additionally, dynamic breakthrough verified capture mixture practical conditions. These results great potential application purification electronic special