Directly Writing Nanodots on Silicon Surface by Combined-Dynamic Dip-Pen Nanolithography

• DOI: 10.4028/www.scientific.net/kem.609-610.191
• Publication Date: 2014-04-10T15:37:55Z
• Authors: Li Jun Yang; Jian Lei Cui; Yang Wang; Shou Wu Guo; Hui Xie; Li Ning Sun
• Keywords: Nanodot; Nanomanufacturing; Dip-Pen Nanolithography; Nanobiotechnology; Nanomaterials

Dip-pen nanolithography (DPN), based on atomic force microscope (AFM) system, is an effective method for nanoscale science and engineering, the potential applications of DPN will be shown in field nanomechanics, nanomaterials, nanobiotechnology, nanomedicine. And novel combined-dynamic mode (CDDPN), rather than mostly used contact or tapping DPN, becomes important tool fabrication nanodots with direct-writing depositing ink onto hard silicon surface at predetermined position, which presented corresponding experiments. In addition, size gradually decreases diameter increase number case AFM tip dipping once. However, height does not monotonically reduce as reduction ink, affected by interaction among relative humidity, tip, substrate material, roughness, etc. For better quality nanodot, process, under optimized process parameters, accomplished once without intermediate scan imaging much possible.