Quantum electrodynamical formulation of photochemical acid generation and its implications on optical lithography

• DOI: 10.4218/etrij.2024-0127
• Publication Date: 2024-10-12T09:10:33Z
• Authors: Seungjin Lee
• Keywords: Photoresist; Feature (linguistics); Quantum Chemistry

Abstract The photochemical acid generation is refined from the first principles of quantum electrodynamics. First, we briefly review formulation theory light based on electrodynamics framework to establish probability at a given spacetime point. mechanical then combined with deprotection mechanism obtain probabilistic description density directly related feature formation in photoresist. A statistical analysis random presented reveal leading characteristics stochastic formation.