PECVD and PEALD on polymer substrates (Part II): Understanding and tuning of barrier and membrane properties of thin films

• DOI: 10.48550/arxiv.2306.14797
• Publication Date: 2023-01-01
• Authors: Teresa de los Arcos; Peter Awakowicz; Marc Böke; Nils Boysen; Ralf Peter Brinkmann; Rainer Dahlmann; Anjana Devi; Denis Eremin; Jonas Franke; Tobias Gergs; Jonathan Jenderny; Efe Ke­man­eci; Thomas D. Kühne; Simon Kusmierz; Thomas Mussenbrock; Jens Rubner; Jan Trieschmann; Matthias Weßling; Xiaofan Xie; David Zanders; Frederik Zysk; Guido Grundmeier
• Keywords: Deposition; Diffusion barrier

This feature article presents insights concerning the correlation of PECVD and PEALD thin film structures with their barrier or membrane properties. While in principle similar precursor gases processes can be applied, adjustment deposition parameters for different polymer substrates lead to either an effective diffusion selective permeabilities. In both cases understanding growth analysis pore size distribution surface chemistry is utmost importance related transport properties small molecules. this regard concepts engineering analytical as well theoretical approaches leading a comprehensive description state art field. Moreover, based on presented structure molecular perspectives future relevant research area presented.