Rare-earth doped yttrium silicate (Y2SiO5) thin films grown by chemical vapour deposition for quantum technologies

• DOI: 10.48550/arxiv.2402.14445
• Publication Date: 2024-02-22
• Authors: Suma Al-Hunaishi; Anna Blin; N. Harada; P. Perrin; Philippe Goldner; Diana Serrano; Alexandre Tallaire
• Keywords: Deposition

Yttrium orthosilicate (Y2SiO5 - YSO) is one of the most promising crystals to host rare-earth (RE) ions for quantum technologies applications. In this matrix, they indeed exhibit narrow optical and spin linewidths that can be exploited develop memories or information processing capabilities. paper, we propose a new method grow RE doped silicate thin films on silicon wafers based direct liquid injection chemical vapour deposition (DLI-CVD). We optimize annealing conditions achieve formation high temperature X2-YSO phase. The phase purity crystalline quality are assessed by evaluating properties Eu3+ embedded in oxide matrix. view results, discuss possible mechanisms, potential wafer-compatible form YSO