Investigating the Impact of Oxygen Surface Plasma Treatments on the Structural and Electrical Properties of Graphene

DOI: 10.5757/asct.2024.33.1.7 Publication Date: 2024-02-02T08:49:52Z
ABSTRACT
This study investigated the variations in structural and electrical characteristics of graphene under different O 2 plasma treatment conditions durations, employing Raman spectroscopy I d -V g measurements.Initially, we examined spectra curves following remote treatments ranging from 1 to 4 s.We observed -doping effects on properties graphene.Subsequently, transitioned a reactive ion etching mode, followed by comparative analysis determine most suitable mode for enhancing without compromising its bonding network integrity.Notably, shift peak positions intensities owing duration revealed that high-energy ions disrupted symmetry orbital bonds graphene, leading formation 3 hybridization bonds.Furthermore, confirmed restorative heat observing changes when plasma-treated was annealed furnace.
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