Periodic feature patterning by lens based solid immersion multiple beam laser interference lithography

• DOI: 10.7452/lapl.201210056
• Publication Date: 2012-06-20T18:45:49Z
• Authors: R Sidharthan; V M Murukeshan
• Keywords: Immersion lithography; Maskless lithography; Immersion; Interference lithography

In this paper, we report a novel concept and methodology to fabricate high resolution periodic features using i-line laser source multiple converging lenses. This configuration reduces the number of optical elements by employing two-lens system direct beams on sample instead conventional mirror assembly that is normally associated with beam interference configurations. A simple 60° prism, 364 nm two lenses are employed implement immersion lithography achieve four interference. Square lattice patterns pitch size 210±8 240±6 recorded positive photo resist technique.