Correlation between thermal hysteresis width and broadening of metal–insulator transition in Cr- and Nb-doped VO2films

Transition temperature Hysteresis Metal–insulator transition Temperature coefficient
DOI: 10.7567/jjap.53.071102 Publication Date: 2014-06-16T16:00:51Z
ABSTRACT
We investigated the effects of Cr and Nb doping on metal–insulator transition (MIT) single-oriented VO2 films deposited Al2O3 substrates. The MIT temperature (TMI) increased with trivalent doping, whereas it decreased pentavalent doping. coefficient resistance (TCR) thermal hysteresis width (ΔTMI) were suppressed by was about twice as effective for decreasing TCR ΔTMI. found that maximum ΔTMI doped have a correlation lattice constant irrespective elements, suggesting deformation caused metal-ion is involved in decreases There also an apparent between films. present findings suggest combination other techniques such strain control required to achieve nonhysteretic large
SUPPLEMENTAL MATERIAL
Coming soon ....
REFERENCES (36)
CITATIONS (66)