CMOS Integration of Thermally Stable Diffusion and Gate Replacement (D&GR) High-k/Metal Gate Stacks in DRAM Periphery Transistors

• DOI: 10.7567/ssdm.2017.k-4-02
• Publication Date: 2019-06-21T07:35:43Z
• Authors: E. Dentoni Litta; R. Ritzenthaler; T. Schram; A. Spessot; B. O'Sullivan; Y. Ji; G. Mannaert; C. Lorant; F. Sebaai; A. Thiam; M. Ercken; S. Demuynck; N. Horiguchi
• Keywords: Dram; Metal gate